The report contains ten-year analysis with the following sections
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Title of patent family (most common patent title) |
Family members |
Filing year |
---|---|---|
implant method and implanter by using a variable aperture | 15 | 2010 |
replacement source/drain finfet fabrication | 13 | 2011 |
method for low temperature ion implantation | 11 | 2010 |
multi-energy ion implantation | 8 | 2012 |
method and apparatus for uniformly implanting a wafer with an ion beam | 8 | 2009 |
medium current ribbon beam for ion implantation | 8 | 2013 |
scan head and scan arm using the same | 8 | 2013 |
plasma-based material modification using a plasma source with magnetic confinement | 8 | 2014 |
forming punch-through stopper regions in finfet devices | 7 | 2015 |
plasma doping a non-planar semiconductor device | 7 | 2012 |