The report contains ten-year analysis with the following sections
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s&stech company | 211 |
sandos tech company | 3 |
sands tech company | 1 |
s&stech company | 20 |
s&stech company | 14 |
Title of patent family (most common patent title) |
Family members |
Filing year |
---|---|---|
mask blank, photomask, and method for manufacturing same | 12 | 2012 |
blankmask and photomask using the same | 8 | 2014 |
blankmask and photomask using the same | 8 | 2015 |
blankmask and method for fabricating photomask using the same | 8 | 2012 |
blankmask and photomask | 8 | 2013 |
phase-shift blankmask and photomask | 8 | 2014 |
phase-shift blankmask and method for fabricating the same | 8 | 2012 |
blankmask and photomask using the same | 7 | 2011 |
phase shift blankmask and photomask | 6 | 2016 |
pellicle for euv lithography and method of fabricating the same | 6 | 2017 |