The report contains ten-year analysis with the following sections
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tokyo ohka kogyo company | 4587 |
riken corporation | 97 |
ulvac | 35 |
marubun corporation | 34 |
toshiba kikai | 33 |
daicel corporation | 22 |
tazmo company | 15 |
tokyo electron | 13 |
kanagawa acad of sci & technol | 11 |
promerus | 11 |
Title of patent family (most common patent title) |
Family members |
Filing year |
---|---|---|
negative electrode base member | 24 | 2006 |
resist composition | 21 | 2003 |
copolymer, resin composition, spacer for display panel, planarization film, thermosettin… 🛈 | 19 | 2007 |
photosensitive composition and compound | 19 | 2014 |
novel compound and method of producing the same, acid generator, resist composition and … 🛈 | 18 | 2007 |
vinyl-group-containing fluorene compound | 17 | 2013 |
resist composition, method of forming resist pattern, novel compound, and acid generator | 17 | 2007 |
fluorene-type compound, photopolymerization initiator comprising said fluorene-type comp… 🛈 | 17 | 2012 |
method for producing porous polyimide film, porous polyimide film and separator using sa… 🛈 | 15 | 2013 |
semiconductor light-emitting element and production method | 15 | 2013 |