The report contains ten-year analysis with the following sections
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Title of patent family (most common patent title) |
Family members |
Filing year |
---|---|---|
methods and systems for utilizing design data in combination with inspection data | 63 | 2005 |
apparatus and methods for determining overlay of structures having rotational or mirror … 🛈 | 24 | 2000 |
methods and systems for inspection of wafers and reticles using designer intent data | 23 | 2003 |
periodic patterns and technique to control misalignment between two layers | 16 | 2001 |
optical imaging system with catoptric objective; broadband objective with mirror; and re… 🛈 | 13 | 2007 |
inspection systems and methods for detecting defects on extreme ultraviolet mask blanks | 13 | 2009 |
substrate matrix to decouple tool and process effects | 12 | 2008 |
systems and methods for measurement of a specimen with vacuum ultraviolet light | 12 | 2004 |
verfahren zum erkennen von überlagerungsfehlern mittels scatterometrie | 11 | 2003 |
model for accurate photoresist profile prediction | 11 | 2014 |