The report contains ten-year analysis with the following sections
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Title of patent family (most common patent title) |
Family members |
Filing year |
---|---|---|
chemical-mechanical polishing liquid | 7 | 2011 |
polishing liquid for tsv blocking layer | 7 | 2011 |
chemical mechanical polishing slurry | 5 | 2010 |
alkaline chemical-mechanical polishing solution | 5 | 2012 |
chemical mechanical polishing slurry | 5 | 2010 |
cleaning composition for removing resist | 4 | 2007 |
a modified silicon dioxide sol, the manufacturing method and use of the same | 4 | 2007 |
a chemical mechanical polishing liquid | 4 | 2008 |
chemical mechanical polishing slurry | 4 | 2010 |
cleaning composition for removing resist | 4 | 2007 |