The report contains ten-year analysis with the following sections
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Title of patent family (most common patent title) |
Family members |
Filing year |
---|---|---|
colloidal silica chemical-mechanical polishing composition | 44 | 2014 |
corrosion inhibitors and related compositions and methods | 34 | 2014 |
polishing pad with multi-modal distribution of pore diameters | 26 | 2010 |
polishing pad with foundation layer and polishing surface layer | 26 | 2011 |
polishing composition and method utilizing abrasive particles treated with an aminosilane | 25 | 2007 |
polishing pad with concentric or approximately concentric polygon groove pattern | 24 | 2011 |
polishing pad with polishing surface layer having an aperture or opening above a transpa… 🛈 | 23 | 2012 |
polishing pad with homogeneous body having discrete protrusions thereon | 23 | 2011 |
methods and compositions for polishing silicon-containing substrates | 21 | 2008 |
soft polishing pad for polishing a semiconductor substrate | 19 | 2010 |